Plasma treatment equipment and protective components

Abstract

This invention provides a plasma treatment apparatus and a protective member for suppressing the consumption of a bonding layer. The plasma treatment apparatus of this invention includes: a base disposed within a plasma treatment chamber; an electrostatic chuck disposed on top of the base; a bonding layer disposed between the base and the electrostatic chuck; and a protective member disposed around the bonding layer; wherein the protective member includes: a first annular member surrounding the bonding layer; and a second annular member covering the outer peripheral surface of the first annular member and having a greater strength than the first annular member.

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