Radio frequency power supply control methods, devices, radio frequency power supplies and semiconductor manufacturing equipment

Abstract

This application provides a control method, apparatus, RF power supply, and semiconductor process equipment for an RF power supply, applicable to the field of semiconductor process equipment technology. The method is applied to an RF power supply that provides at least one pulse signal in each operating cycle. In each operating cycle of the RF power supply, one of the pulse signals is controlled according to a first control method. This first control method involves adjusting the bus voltage output to the RF power supply based on the current forward power feedback value, reflected power feedback value, dissipated power feedback value, and bus voltage threshold value, while maintaining the bias voltage output to the RF power supply unchanged. Compared to the protection circuits built based on electronic components in the prior art, this application provides a software protection mechanism. The execution process is less susceptible to factors such as ambient temperature and electromagnetic interference, making the protection mechanism more reliable and ensuring the safety of the RF power supply during operation.

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