Ferroelectric field effect transistor, memory device including the same, and electronic apparatus including the memory device
TW202636792APending Publication Date: 2026-09-01SAMSUNG ELECTRONICS CO LTD
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Patent Information
- Application Number
- TW114143771
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-11-18
- Filing Date
- 2025-11-10
- Publication Date
- 2026-09-01
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Figure TWG2TA001074638_001 
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Abstract
A ferroelectric field effect transistor (FeFET), a memory device including the FeFET, and an electronic apparatus including the FeFET are provided. The FeFET includes a gate electrode, a ferroelectric layer provided on the gate electrode, an intermediate conductive layer provided on the ferroelectric layer, a gate insulating layer provided on the intermediate conductive layer, a channel layer provided on the gate insulating layer, and a source electrode and a drain electrode provided on the channel layer. The source electrode and the drain electrode each contact the gate insulating layer.
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