Substrate processing apparatus and substrate processing method

Abstract

This disclosure provides a substrate processing apparatus and method for cleaning a cup portion that captures processing liquid scattering from a substrate. The processing unit includes: a rotation mechanism that rotates a substrate holding portion; a processing mechanism that sprays processing liquid from a spray outlet toward the periphery of the substrate; and an anti-scattering mechanism having a rotating cup portion that surrounds the outer periphery of the rotating substrate and captures the processing liquid scattering from the substrate as the substrate holding portion rotates; and the processing mechanism having a cleaning nozzle for cleaning the rotating cup portion.

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