Holding device, substrate processing device and holding position adjustment method

Abstract

This invention provides a holding device that improves operability when adjusting levelness. The holding and rotating mechanism of this invention includes: a holding part that holds a base plate; a base part that mounts the holding part; an elastic member disposed between the holding part and the base part; and a fixing part that fixes the holding part and the base part by applying a force in a direction that brings the holding part and the base part closer together, thereby deforming the elastic member.

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