Substrate processing system, method of measuring state of substrate in substrate processing system, and non-transitory computer-readable medium for determining state of substrate transferring in substrate processing system

TW202636930APending Publication Date: 2026-09-01ASM IP HLDG BV
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Patent Information

Application Number
TW114148052
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-12
Filing Date
2025-12-09
Publication Date
2026-09-01

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Abstract

A system and a process for monitoring substrates is disclosed. The system and process may include a gate valve, a robot configured to transfer a substrate from a first chamber to a second chamber through the gate valve, and a sensor array aligned with the gate valve. The sensor array may be configured to capture data of the substrate along a single dimension when the substrate is moved in view of the sensor array. The system and process may assist to provide a less complex and less time consuming way to fully inspect a wafer.
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