Inspection equipment and inspection methods

TW202636936APending Publication Date: 2026-09-01HAMAMATSU PHOTONICS KK
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Patent Information

Application Number
TW114150167
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-19
Filing Date
2025-12-19
Publication Date
2026-09-01

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Abstract

The inspection apparatus disclosed herein includes: an image acquisition unit 11 that acquires an overall image of a wafer, the wafer comprising a plurality of blocks arranged at predetermined intervals, and each of the plurality of blocks comprising a plurality of light-emitting elements; a block area setting unit 14 that sets a plurality of block areas corresponding to the plurality of blocks for the overall image; and an inspection unit 17 that inspects at least one block area among the plurality of block areas and generates data indicating the inspection result.
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