Evaluation methods for pattern formation and positional variation
TW202636939APending Publication Date: 2026-09-01NUFLARE TECH INC
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Patent Information
- Application Number
- TW114150465
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-01-22
- Filing Date
- 2025-12-22
- Publication Date
- 2026-09-01
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Abstract
A method for forming an evaluation pattern and a method for evaluating positional variations are provided, which can accurately measure the effect of pattern density on the irradiation position of a beam. One aspect of the method for forming the evaluation pattern includes: a step of irradiating a sample with a beam of charged particles to draw a plurality of first patterns with different pattern densities; and a step of drawing a plurality of second patterns with different pattern densities such that, when combined with at least a portion of the aforementioned plurality of first patterns, the pattern densities of each pattern tend to be equal, thereby forming a plurality of evaluation patterns with equal pattern densities.
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