Method and system for reducing NOX emissions from semiconductor process tools
TW202637264APending Publication Date: 2026-09-16TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information
- Application Number
- TW114116780
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-14
- Filing Date
- 2025-05-05
- Publication Date
- 2026-09-16
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Abstract
A catalytic reactor is included in a local scrubber of a semiconductor process tool to convert NO and NO2 into higher-order nitrogen oxides for subsequent removal by a central air treatment system. Reactive oxygen species are provided by an ambient temperature plasma generator. Reducing agents such as ammonia are not needed, and NOx removal efficiency is greatly increased.
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