Manufacturing apparatus for anti-reflective film
TW202637363APending Publication Date: 2026-09-16NITTO DENKO CORP
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Patent Information
- Application Number
- TW115101414
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-01-30
- Filing Date
- 2026-01-14
- Publication Date
- 2026-09-16
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Abstract
The apparatus for manufacturing an antireflective film of the present invention manufactures an antireflective film comprising a substrate and an antireflective layer disposed on one side of the substrate in the thickness direction. The apparatus includes: a conveying unit for conveying the substrate; and an optical measurement unit for measuring the reflectivity of the antireflective film conveyed by the conveying unit. The optical measurement unit includes: a light irradiation section for irradiating the antireflective layer with light; and a light receiving section for receiving reflected light from the antireflective layer. The light receiving section includes a collimating lens, a beam-collecting lens, and a beam splitter. The collimating lens converts the reflected light into collimated light. The beam-collecting lens focuses the collimated light onto the beam splitter.
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