Manufacturing apparatus for anti-reflective film

TW202637363APending Publication Date: 2026-09-16NITTO DENKO CORP
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW115101414
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-30
Filing Date
2026-01-14
Publication Date
2026-09-16

Smart Images

  • Figure TWG2TA001077051_001
    Figure TWG2TA001077051_001
  • Figure TWG2TA001077051_002
    Figure TWG2TA001077051_002
  • Figure TWG2TA001077051_003
    Figure TWG2TA001077051_003
Patent Text Reader

Abstract

The apparatus for manufacturing an antireflective film of the present invention manufactures an antireflective film comprising a substrate and an antireflective layer disposed on one side of the substrate in the thickness direction. The apparatus includes: a conveying unit for conveying the substrate; and an optical measurement unit for measuring the reflectivity of the antireflective film conveyed by the conveying unit. The optical measurement unit includes: a light irradiation section for irradiating the antireflective layer with light; and a light receiving section for receiving reflected light from the antireflective layer. The light receiving section includes a collimating lens, a beam-collecting lens, and a beam splitter. The collimating lens converts the reflected light into collimated light. The beam-collecting lens focuses the collimated light onto the beam splitter.
Need to check novelty before this filing date? Find Prior Art