Organotin compositions with iodo species and radiation sensitive films

TW202637475APending Publication Date: 2026-09-16INPRIA CORP
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Patent Information

Application Number
TW114146388
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-02
Filing Date
2025-11-27
Publication Date
2026-09-16

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Abstract

Organometallic patterning compositions are modified with iodine to improve radiation sensitivity and reduce radiation dose without significant loss of pattern quality. Iodine can be introduced as ligands to the metal ion and / or through introduction of iodide containing additives. Iodine is found to survive, at least in part, pre-irradiation processing. Thus, iodide ions are maintained in some form in the films being irradiated.
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