Yttrium protective film, components and plasma treatment equipment
TW202637479APending Publication Date: 2026-09-16AGC INC
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Patent Information
- Application Number
- TW115102843
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-01-24
- Filing Date
- 2026-01-23
- Publication Date
- 2026-09-16
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Figure TWG2TA001077103_001 
Figure TWG2TA001077103_002
Abstract
This invention provides a yttrium protective film with excellent plasma resistance. The yttrium protective film contains yttrium and oxygen, and has an optical band gap of 5.0 eV or less. Preferably, the yttrium protective film exhibits a peak with a full width at half maximum (FWHM) of 100 cm⁻¹ or less in the Raman spectrum, occurring in the range of 833 cm⁻¹ to 837 cm⁻¹. Preferably, the yttrium content of the yttrium protective film is 35 atomic% to 45 atomic% relative to the total yttrium and oxygen content. Preferably, the oxygen content of the yttrium protective film is 55 atomic% to 65 atomic% relative to the total yttrium and oxygen content.
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