Yttrium protective film, components and plasma treatment equipment

TW202637479APending Publication Date: 2026-09-16AGC INC
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Patent Information

Application Number
TW115102843
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-24
Filing Date
2026-01-23
Publication Date
2026-09-16

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Abstract

This invention provides a yttrium protective film with excellent plasma resistance. The yttrium protective film contains yttrium and oxygen, and has an optical band gap of 5.0 eV or less. Preferably, the yttrium protective film exhibits a peak with a full width at half maximum (FWHM) of 100 cm⁻¹ or less in the Raman spectrum, occurring in the range of 833 cm⁻¹ to 837 cm⁻¹. Preferably, the yttrium content of the yttrium protective film is 35 atomic% to 45 atomic% relative to the total yttrium and oxygen content. Preferably, the oxygen content of the yttrium protective film is 55 atomic% to 65 atomic% relative to the total yttrium and oxygen content.
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