Chemically amplified positive resist composition and resist pattern forming process

TW202637526APending Publication Date: 2026-09-16SHIN ETSU CHEMICAL CO LTD
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Patent Information

Application Number
TW115117983
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-03-04
Filing Date
2025-03-03
Publication Date
2026-09-16

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Abstract

An onium salt containing a sulfonic acid anion having a substituted fused ring structure and an aromatic sulfonic acid structure has solvent solubility and generates an acid with reduced diffusion. A chemically amplified positive resist composition comprising the onium salt as a photoacid generator and a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer is processed by lithography to form a pattern of rectangular profile.
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