Inhibitor composition, inhibitor pattern formation method, compound, acid generating agent and acid diffusion control agent

TW202637530APending Publication Date: 2026-09-16TOKYO OHKA KOGYO CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW114148159
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-10
Filing Date
2025-12-09
Publication Date
2026-09-16
Patent Text Reader

Abstract

An inhibitor composition that generates acid upon exposure and whose solubility in a developer changes due to the acid, and contains a compound comprising a cation (CO) represented by the following general formula (CO). In the formula, R1 is a substitutable hydrocarbon group, X is a halogen atom, R2 is a substitutable hydrocarbon group, Ar1 and Ar2 are each independently a substitutable aryl group, and n is an integer from 0 to 3.
Need to check novelty before this filing date? Find Prior Art