Salts, photoresist compositions, and pattern formation methods

Abstract

A salt comprising a cation represented by formula (1) or (2): In formulas (1) and (2), Ar1 to Ar5 are each independently a substituted or unsubstituted C6-30 aryl or a substituted or unsubstituted C3-30 heteroaryl, wherein at least one of Ar1 to Ar3 in formula (1) and at least one of Ar4 to Ar5 in formula (2) have formula (A): In formula (A), each Ara is independently a group having formula (B) or (C): The remaining groups of formulas (1), (2), (A), (B) and (C) are as provided herein. A salt comprising a cation represented by Formula (1) or (2): wherein, in Formulae (1) and (2), Ar1 to Ar5 are each independently substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl, wherein at least one of Ar1 to Ar3 in Formula (1) and at least one of Ar4 to Ar5 in Formula (2) is of Formula (A): Wherein, in Formula (A), each Ara is independently a group of Formula (B) or (C): wherein the remaining groups of Formulae (1), (2), (A), (B), and (C) are as provided herein.