Manufacturing method of patterned film, patterned film, and polymeric components

Abstract

This invention provides a method for manufacturing a patterned film. This method can produce a patterned film with a high refractive index, capable of transferring high-precision patterns from a mold, and exhibiting minimal pattern shape changes even during heating, resulting in high reliability. This invention relates to a method for manufacturing a patterned film, which includes pressing a polymeric composition containing a polymeric monomer as shown in the following general formula (1) using a mold. (In formula (1), R1 represents an organic group with 1 to 30 carbon atoms and an aromatic group. R2 represents -O-, -S-, or -NH-. R3 represents a hydrogen atom or a methyl group. X1, Y1, and Z1 may be the same or different, representing -CR4R5- or an oxygen atom. R4 and R5 may be the same or different, representing a hydrogen atom or a methyl group. At least one of X1, Y1, and Z1 is an oxygen atom. n represents an integer greater than or equal to 1.) none