Method for manufacturing salt, acid generating agent, resin, resist composition and resist pattern

Abstract

The object of this invention is to provide an acid generator and a resist composition capable of producing resist patterns with good CD uniformity. An acid generator contains a salt represented by formula (I) or a structural unit represented by formula (IP). [In the formula, Q1, Q2, R1, and R2 represent hydrogen atoms, fluorine atoms, etc., respectively; z represents an integer from 0 to 6; X0 represents a single bond or -O-, etc.; mm1 represents 0 or 1; L1 and L2 represent a single bond or a substituted / unsubstituted hydrocarbon group, respectively; W1 represents a single bond or a substituted / unsubstituted cyclic hydrocarbon group; A1 represents a single bond or a substituted / unsubstituted hydrocarbon group; R3 represents a substituted / unsubstituted acid-stabilized hydrocarbon group; R4 represents a halogen atom, cyano, nitro, or hydrocarbon group; m2 represents an integer from 0 to 3; X1 represents a single bond, -O-, etc.; R0 represents a hydrogen atom, halogen atom, etc.; ZI+ represents an organic cation, and the hydrocarbon group and cyclic hydrocarbon group can be substituted with -O-, -S-, -SO2-, etc.]