Hypervalent iodine compound, resist composition, laminate obtained from the resist composition, and patterning process

Abstract

carbon atoms and optionally containing a heteroatom, the R1 and the R2 optionally being bonded to each other to form a ring together with the carbon atoms bonded thereto and the atoms between the carbon atoms. This can provide: a non-chemically amplified resist composition excellent in sensitivity and resolution in lithography using a high-energy beam, especially electron beam (EB) lithography and EUV lithography; a laminate obtained from the resist composition; and a patterning process using the resist composition.