Composition, precursor vessel, method and system for depositing material

TW202637564APending Publication Date: 2026-09-16ASM IP HLDG BV
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Patent Information

Application Number
TW114150127
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-24
Filing Date
2025-12-19
Publication Date
2026-09-16

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Abstract

and: - wherein R1 and R2 are each independently selected from C1 to C8 alkyl groups, and wherein R3 is a C2 to C8 alkyl group, or - wherein R1 together with R2 and N forms a four to nine membered ring, and: R3 is selected from C1 to C8 alkyl groups, or R3 together with R2 and N forms a four to nine membered ring.
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