Composition, method of preparing fine pattern by using the same, and method of manufacturing semiconductor device by using the same

TW202637568APending Publication Date: 2026-09-16SAMSUNG ELECTRONICS CO LTD
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Patent Information

Application Number
TW115102218
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-11
Filing Date
2026-01-20
Publication Date
2026-09-16

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Abstract

Provided are a composition including a solvent and a protection layer-forming material, a method of preparing a fine pattern by using the same, and a method of manufacturing a semiconductor device by using the same. The protection layer-forming material may include a compound represented by Formula
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