Method for manufacturing composition for retardation film formation and monolayer retardation material

TW202637618APending Publication Date: 2026-09-16NISSAN CHEM CORP
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Patent Information

Application Number
TW114149840
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-18
Filing Date
2025-12-18
Publication Date
2026-09-16
Patent Text Reader

Abstract

The phase difference film forming composition of the present invention contains a polymer (P) having a terminal group derived from a polymerization control agent (A), the polymerization control agent (A) having a structure selected from the group consisting of trithiocarbonate, dithiocarbamate, dithiobenzoate and dithiocarbonate, wherein the polymer (P) is a polymer having a structural unit (X) derived from a monomeric compound having a photosensitive group (p) and a polymerizable unsaturated bond group.
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