Resin composition, cured material, laminate, method for manufacturing cured material, method for manufacturing laminate, method for manufacturing semiconductor device and semiconductor device, and polyimide and method for synthesizing polyimide.

TW202637619APending Publication Date: 2026-09-16FUJIFILM CORP
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Patent Information

Application Number
TW115104887
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-17
Filing Date
2026-02-06
Publication Date
2026-09-16
Patent Text Reader

Abstract

The present invention provides a resin composition, a cured product formed by curing the resin composition, a laminate containing the cured product, a method for manufacturing the cured product, a method for manufacturing the laminate, a method for manufacturing a semiconductor device including the method for manufacturing the cured product, a semiconductor device containing the cured product, and a novel polyimide and a method for synthesizing the same, wherein the resin composition contains polyimide, and the polyimide is a copolymer comprising blocks formed by repeating units represented by formula (1-1) and blocks formed by repeating units represented by formula (1-2), and satisfies all of the following conditions 1, 2 and 3.
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