Composition, reactive film, underlayer film, method for producing structure containing phase-separated structure, and polymer
TW202637646APending Publication Date: 2026-09-16TOKYO OHKA KOGYO CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW114149970
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-26
- Filing Date
- 2025-12-18
- Publication Date
- 2026-09-16
Smart Images

Figure 00000000_0000_ABST
Abstract
Problem: To provide a method for manufacturing a composition, reactive film, lower film, and structure containing phase separation structure that can easily form a guiding pattern with excellent heat resistance, and a polymer. Solution: A composition containing a polymer (A), wherein the polymer (A) has: a structural unit (A1) comprising a structure in which hydrogen atoms in a carboxyl or hydroxyl group are replaced by an acid-dissociable group; and a structural unit (A2) derived from styrene and / or styrene derivatives, wherein the acid-dissociable group is not an aliphatic group containing a tertiary carbon atom or an acetal protecting group.
Need to check novelty before this filing date? Find Prior Art
