Composition, reactive film, underlayer film, method for producing structure containing phase-separated structure, and polymer

TW202637646APending Publication Date: 2026-09-16TOKYO OHKA KOGYO CO LTD
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Patent Information

Application Number
TW114149970
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-26
Filing Date
2025-12-18
Publication Date
2026-09-16

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Abstract

Problem: To provide a method for manufacturing a composition, reactive film, lower film, and structure containing phase separation structure that can easily form a guiding pattern with excellent heat resistance, and a polymer. Solution: A composition containing a polymer (A), wherein the polymer (A) has: a structural unit (A1) comprising a structure in which hydrogen atoms in a carboxyl or hydroxyl group are replaced by an acid-dissociable group; and a structural unit (A2) derived from styrene and / or styrene derivatives, wherein the acid-dissociable group is not an aliphatic group containing a tertiary carbon atom or an acetal protecting group.
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