Resistor composition, resistor pattern formation method, polymer compounds and compounds

Abstract

An inhibitor composition comprising a resin component (A1) having a constituent unit (a0) derived from a compound represented by a general formula (a0-1) (where W0 represents a polymerizable group; L01 represents a divalent linking group or a single bond; Rdg is an acid-dissociative group represented by a general formula (Rdg-1); Xr, Xs, and Xt are each independently a carbon atom; H ​​is a hydrogen atom; X0 is an alicyclic hydrocarbon ring that may have substituents; Ar0 is an aromatic ring; Rf0 is a fluorine atom or a trifluoromethyl group; m is an integer greater than or equal to 1 as long as the valence is allowed; * is a bonding portion bonded to the carbonyl group -C(=O)-O- in the aforementioned general formula (a0-1)).

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