Polishing additive and polishing composition containing the same

Abstract

The object of this invention is to provide an abrasive additive that can improve the abrasive selectivity of a metal film relative to an insulating film, and an abrasive composition containing the abrasive additive. The solution of this invention is an abrasive additive composed of at least one polyether amine compound selected from formulas (1) and (2). (In formula (1), AO represents an oxyalkylene with 2 to 4 carbon atoms, m is the average addition mole number of the oxyalkylene and is 1 to 60, n is 1 to 4, and each R is independently a hydrogen atom or a hydrocarbon group with 1 to 4 carbon atoms) (In formula (2), AO represents an oxyalkylene with 2 to 4 carbon atoms, m is the average addition mole number of the oxyalkylene and is 1 to 60, and each R is independently a hydrogen atom or a hydrocarbon group with 1 to 4 carbon atoms).