Resin composition, cured material, transfer film, multilayer, manufacturing method of cured material, manufacturing method of multilayer, manufacturing method of semiconductor device, and semiconductor device.

TW202637709APending Publication Date: 2026-09-16FUJIFILM CORP
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW114147550
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-06
Filing Date
2025-12-04
Publication Date
2026-09-16
Patent Text Reader

Abstract

A resin composition comprising a resin (A) which is at least one of a polyimide precursor and a polyimide, wherein the resin (A) has a structure represented by formula (1-1) as described in the specification, and the content of the structure represented by formula (1-1) as described in the specification in the resin (A) is 0.01% by mass or more and 5.0% by mass or less.
Need to check novelty before this filing date? Find Prior Art