Method for manufacturing adhesive composition, laminate, and processed semiconductor substrate

TW202637716APending Publication Date: 2026-09-16NISSAN CHEM CORP
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW115105271
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-17
Filing Date
2026-02-10
Publication Date
2026-09-16

Smart Images

  • Figure 00000000_0000_ABST
    Figure 00000000_0000_ABST
Patent Text Reader

Abstract

The present invention provides an adhesive composition for forming an adhesive layer, wherein the adhesive layer is used to temporarily bond a semiconductor substrate or electronic device layer to a support substrate; the adhesive composition contains an adhesive component that is cured by a hydrosiliconization reaction; the adhesive component contains a divalent or tetravalent platinum complex catalyst that does not contain halogen atoms.
Need to check novelty before this filing date? Find Prior Art