Targets, sintered bodies, films, and methods for manufacturing them

TW202637865APending Publication Date: 2026-09-16JX NIPPON MINING & METALS CORP
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Patent Information

Application Number
TW114152187
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-27
Filing Date
2025-12-31
Publication Date
2026-09-16

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Abstract

The purpose of this invention is to provide a means for suppressing particles in a tungsten silicide target. The invention relates to a target, which is a tungsten silicide target having a two-phase structure of WSi2 and Si phases, wherein the atomic ratio is represented by WSix (where X > 2.0), and the particle size distribution of the Si phase satisfies all of the following conditions: D10 (area distribution): 0.40–1.25 μm, D50 (area distribution): 1.65–2.95 μm, D90 (area distribution): 3.00–5.80 μm. none
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