Rapid temperature switching for substrate processing chambers

Abstract

A system for performing operations in a processing volume of a processing chamber on a substrate is disclosed herein. The processing chamber includes a substrate support configured to support a substrate. The substrate support has a ESC having a substrate supporting surface and a mounting surface. The substrate support has a base having a top surface wherein the top surface of the base at least partially supports the mounting surface of the ESC. An upper opening extends through the top surface into the base. The substrate support has a LED heater. The LED heater has an upper surface, a lower surface and an outer perimeter. The LED heater has a cooling plate with cooling channels therein. The LED heater has an LED plate disposed on the cooling plate wherein the LED plate has a plurality of LEDs disposed on the top surface of the LED heater.

Images