Chamber cleaning method

TW202637895APending Publication Date: 2026-09-16JUSUNG ENG
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Patent Information

Application Number
TW114150069
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-23
Filing Date
2025-12-19
Publication Date
2026-09-16

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Abstract

A method for cleaning a chamber in which a layer containing ruthenium is deposited may include the steps of (a) injecting an oxygen-containing gas into the chamber; and (b) injecting a hydrogen-containing gas into the chamber.
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