Optics damage metrology in excimer light sources
TW202638174APending Publication Date: 2026-09-16CYMER INC
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Patent Information
- Application Number
- TW114147650
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-23
- Filing Date
- 2025-12-05
- Publication Date
- 2026-09-16
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Abstract
A system includes: an excimer laser configured to generate light having a first wavelength, the excimer laser including at least one optical element interacting with the generated light; a sensor device configured to detect light emanating from the optical element, the detected light having one or more wavelengths that are distinct from the first wavelength; and an assessment module in communication with the sensor device. The assessment module is configured to: analyze the detected light; and generate an estimate of damage to the optical element based on the analysis.
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