Multi-frequency inductively coupled plasma sources

Abstract

Methods and apparatus for inductively coupled plasma (ICP) chambers allow for a coil assembly to be energized with a plurality of RF power sources with the same or different frequencies. A method of energizing the coil assembly may include generating a first RF power with a first frequency where the first RF power is electrically connected to the coil assembly via a first match network and the coil assembly is positioned atop the ICP chamber and generating a second RF power with a second frequency where the second RF power is electrically connected to the coil assembly via a second match network and the second frequency may be the same or different from the first frequency. In some embodiments, the coil assembly has at least one inner coil and at least one outer coil that is positioned concentrically about the inner coil.

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