Methods for forming fine patterned areas

Abstract

The objective of this invention is to form multiple regions with fine patterns on a workpiece at low cost and with ease. A method for forming multiple regions 12 with fine patterns 11 on a workpiece 1 comprises: a first mask layer forming step, forming a first mask layer 2 on the workpiece 1; a first mask pattern forming step, forming a first mask pattern 21 on the first mask layer 2 using an embossing method; a second mask layer forming step, forming a second mask layer 4 on the first mask layer 2 where the first mask pattern 21 has been formed; a second mask pattern forming step, forming a second mask pattern 41 on the second mask layer 4 using a photolithography method; and a fine pattern region forming step, forming multiple regions 12 with fine patterns 11 on the workpiece 1 using the first mask pattern 21 and the second mask pattern 41.

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