Method and device for producing bubble-free ultrapure water for cleaning semiconductor substrates

Abstract

Device and method for removing microbubbles from ozonated deionized water (DI / O3), comprising: an inner chamber, an outer chamber, the two chambers being connected with a permeable membrane, and an inlet designed such that ozonated deionized water (DI / O3) can be forced into the inner chamber, and an outlet designed such that ozonated deionized water (DI / O3) can escape from the outer chamber, and a venting line designed such that gases from the upper part of the outer chamber can be collected and conducted away.

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