Process management system, method, and method for manufacturing epitaxial wafer

TW202638924APending Publication Date: 2026-09-16SUMCO CORP
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Patent Information

Application Number
TW114143702
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-02
Filing Date
2025-11-10
Publication Date
2026-09-16

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Abstract

The present invention provides a process control system, the objective of which is to easily verify the correctness of input information, even for process parameters that must be successively changed within a recipe set in a processing apparatus. To achieve this, when verifying whether each process parameter in a recipe (R) stored in the processing apparatus
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