Semiconductor structure and manufacturing method threreof

Abstract

The present invention provides a semiconductor structure and its manufacturing method which mainly provide a semiconductor base, which is defined with adjacent active area and idle area, wherein the active area is provided with a plurality of semiconductor base units, and each semiconductor base unit is defined with an electrical contact dense area and an electrical contact sparse area, then a plurality of conductive bumps are electroplated on each semiconductor base unit in the active area and a plurality of current control bumps are electroplated in the idle area to avoid uneven distribution of electroplating current.

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