Cleaning equipment and cleaning system

TW202639239APending Publication Date: 2026-10-01SHIBAURA MECHATRONICS CORP
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Patent Information

Application Number
TW115107932
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2026-01-07
Filing Date
2026-03-04
Publication Date
2026-10-01

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Abstract

The present invention addresses the issue of preferably cleaning the lid of a substrate storage container in a cleaning process apparatus for cleaning the lid of the substrate storage container. The cleaning process apparatus includes: a cleaning tank for receiving the lid of the substrate storage container; a holding portion for holding the lid with its inner side facing downwards; a first cleaning liquid supply portion for supplying a first cleaning liquid to the inner side; a lower cleaning liquid supply portion for supplying a second cleaning liquid to the inner side of the lid; and an upper cleaning liquid supply portion for supplying the second cleaning liquid to the outer side of the lid.
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