Substrate cleaning apparatus and substrate cleaning method

Abstract

A substrate cleaning apparatus and a substrate cleaning method are provided. The substrate cleaning apparatus (18) begins to supply a first rinsing liquid to the surface (W1) of a substrate (W) from a rinsing liquid nozzle (75). Then, after a liquid film for particle removal is formed on the surface (W1) of the substrate (W) by the first rinsing liquid, a jet stream of cleaning liquid is sprayed from a jet nozzle (72) onto the surface (W1) of the substrate (W), and a cleaning arm (73) begins to move. Furthermore, after the movement of the cleaning arm (73) begins, a second rinsing liquid is supplied to the surface (W1) of the substrate (W) from the rinsing liquid nozzle (75), thereby forming a liquid film for particle removal on the surface (W1) of the substrate (W).

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