Silicon dioxide gel, dispersion, dispersion assembly, low refractive index layer, optical component, optical device, method for manufacturing silicon dioxide gel, and method for manufacturing low refractive index layer.

TW202639432APending Publication Date: 2026-10-01NITTO DENKO CORP
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Patent Information

Application Number
TW115102385
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-21
Filing Date
2026-01-21
Publication Date
2026-10-01
Patent Text Reader

Abstract

This invention provides a silica gel capable of manufacturing a low-refractive-index layer that achieves both low refractive index and low haze value. The silica gel of this invention is characterized in that it is manufactured by polymerizing raw materials in the presence of a catalyst, wherein the molecular volume of the catalyst in dimethyl sulfoxide is less than 100-150 cm³ / mol.
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