Radiosensitive linear components, patterning methods and onium salt compounds

Abstract

The present invention provides a radiosensitive linear composition, a pattern forming method, and an onium salt compound that can fully exert sensitivity, LWR, CDU, pattern rectangularity, depth of focus (DOF), pre- and post-exposure storage stability, and development defect suppression during pattern formation. A radiosensitive linear composition comprises an onium salt compound represented by the following formula (1), a polymer, and a solvent. (In the formula, R1 is -CN, -NO2, -SO2-R11, -F, a monovalent hydrocarbon group with 1 to 10 carbon atoms, or a monovalent fluorinated hydrocarbon group with 1 to 20 carbon atoms; R2 is -CN, -NO2, -CF2H, or -SO2-R21; R11 and R21 are monovalent hydrocarbon groups with 1 to 20 carbon atoms; R3 and R4 are hydrogen atoms or monovalent organic groups with 1 to 20 carbon atoms; X is -O-, -S-, -SO-, -SO2-, or -NR'-; Wa is a hydrogen atom or a monovalent organic group with 1 to 40 carbon atoms; Z+ is an organic cation)