Resistor materials and pattern formation methods
TW202639503APending Publication Date: 2026-10-01TOKYO OHKA KOGYO CO LTD
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Patent Information
- Application Number
- TW114142787
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-11-05
- Filing Date
- 2025-11-04
- Publication Date
- 2026-10-01
Abstract
The present invention provides a resist material, which is a resist material containing at least two different polyacid salts (A1) and (A2) as (A) polyacid salts, characterized in that the aforementioned polyacid salts (A1) and / or (A2) contain one or more polar groups having acid dissociation groups.
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