Modified heteropolyacid salts or mixtures thereof at the defective site, inhibitor materials and pattern formation methods
TW202639516APending Publication Date: 2026-10-01TOKYO OHKA KOGYO CO LTD
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Patent Information
- Application Number
- TW114146170
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-11-27
- Filing Date
- 2025-11-26
- Publication Date
- 2026-10-01
Abstract
The present invention provides a heteropoly acid salt or mixture thereof modified with defects, wherein the cation portion of the aforementioned heteropoly acid salt modified with defects contains an organothionium cation, and the aforementioned organothionium cation is characterized by having one or more polar groups with acid dissociation groups and one or more electron-attracting groups.
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