Modified heteropolyacid salts or mixtures thereof at the defective site, inhibitor materials and pattern formation methods

Abstract

The present invention provides a heteropoly acid salt or mixture thereof with modified defect sites, wherein the cation portion of the aforementioned heteropoly acid salt with modified defect sites contains an organosulfonium cation, and the aforementioned organosulfonium cation has one or more polar groups with acid dissociation groups and one or more iodine atoms as the characteristics of the heteropoly acid salt or mixture thereof with modified defect sites.