Compounds, nonionic photoacid generators, and resin compositions for photolithography

Abstract

This invention provides a compound with excellent alkali resistance. The compound of this invention is represented by the following formula (1). In the following formula (1), R1 and R4 may be the same or different, and are hydroxyl, alkoxy with 1 to 30 carbons, or alkylthio with 1 to 30 carbons; R2, R3, R5, and R6 may be the same or different, and are hydrogen atoms, hydroxyl, alkoxy with 1 to 30 carbons, or alkylthio with 1 to 30 carbons; Rf is a hydrocarbon group with 1 to 30 carbons that can be substituted by a fluorine atom. none