Precursor composition for improving electrical properties of a metal film, the metal film and the method thereof

TW202639570APending Publication Date: 2026-10-01JIANGSU NATA OPTO ELECTRONIC MATERIAL CO LTD +1
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Patent Information

Application Number
TW115110236
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-21
Filing Date
2026-03-18
Publication Date
2026-10-01

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Abstract

The present application discloses a precursor composition for improving electrical properties of a metal film, the metal film, and preparation thereof. The precursor composition contains a precursor, a dopant, and an optional solvent. By adding the dopant to the precursor, electrical properties of the deposited metal film can be significantly improved. For example, the capacitance density is increased by
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