Compounds having a silane ester structure of acetylate, methods for manufacturing the same, and curing components and curing products containing the same.

TW202639573APending Publication Date: 2026-10-01SHIN ETSU CHEMICAL CO LTD
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Patent Information

Application Number
TW114145085
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-20
Filing Date
2025-11-19
Publication Date
2026-10-01

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Abstract

The subject of this invention is to provide a composition that is well soluble in resins or solvents and stable in neutral conditions, and to provide a compound having a silane ester structure that can be used as a curing agent for various resins. As a solution, the present invention provides a compound having a silane ester structure represented by the following general formula (1), [wherein, R1 represents a hydrogen atom, or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms that may be separated by oxygen, nitrogen, silicon, sulfur atoms or siloxane bonds, R2 each independently represents an unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, R3 each independently represents a hydrogen atom, CO2SiR23, OSiR23 (wherein, R2 represents the same meaning as above), but at least one of R3 is CO2SiR23 or OSiR23, and A represents a benzene ring or a cyclohexane ring].
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