Resin composition, cured material, laminate, method for manufacturing cured material, method for manufacturing laminate, method for manufacturing semiconductor device, and semiconductor device.

TW202639715APending Publication Date: 2026-10-01FUJIFILM CORP
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW114150671
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-25
Filing Date
2025-12-23
Publication Date
2026-10-01
Patent Text Reader

Abstract

A resin composition, a cured material, a laminate, a method for manufacturing the cured material, a method for manufacturing the laminate, a method for manufacturing a semiconductor device, and a semiconductor device, wherein the resin composition contains a polyimide precursor, an acidic compound, and a basic compound, wherein the first dissociation constant of the conjugate acid of the basic compound is 12.0 or more, the first dissociation constant of the acidic compound is 5.0 or less, and the ratio X / Y of the amount of acidic compound added X [mol] to the amount of basic compound added Y [mol] is 1.01 or more.
Need to check novelty before this filing date? Find Prior Art