Method for manufacturing negative photopolymerizable compositions for forming microlens shapes and patterns and optical elements

TW202639738APending Publication Date: 2026-10-01TOKYO OHKA KOGYO CO LTD
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Patent Information

Application Number
TW115102293
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-24
Filing Date
2026-01-21
Publication Date
2026-10-01
Patent Text Reader

Abstract

The objective of this invention is to provide a negative photopolymerizable composition for forming microlens-shaped patterns, which exhibits excellent sensitivity and post-exposure stability, and is capable of forming microlens-shaped patterns with uniform shape and excellent chemical resistance; and a method for manufacturing an optical element using the negative photopolymerizable composition. This invention employs a negative photopolymerizable composition for forming microlens-shaped patterns, which is used in the formation of a photosensitive layer in a method comprising: irradiating a photosensitive layer with KrF rays for KrF exposure; developing the exposed photosensitive layer by heating it to form a dot pattern containing a plurality of dots; and deforming the dots by heating them to form a microlens-shaped pattern containing a plurality of dots with microlens shapes. The composition includes a photopolymerizable compound (A) and a photosensitizer (B).
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