Ultralow-ri materials, low-k dielectric materials, composites, and methods

TW202639749APending Publication Date: 2026-10-01BREWER SCIENCE INC
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Patent Information

Application Number
TW115102656
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-22
Filing Date
2026-01-22
Publication Date
2026-10-01

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Abstract

A method of forming a nanoporous structure includes applying a composition including a siloxane polymer and a porogen to a substrate. The composition optionally includes a curing catalyst different from the porogen. The siloxane polymer is crosslinked and then contacted with a developer so as to remove the porogen and form pores in the crosslinked composition to yield the nanoporous structure.
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