Vapor deposition hood, framed vapor deposition hood, method for manufacturing vapor deposition hood, method for manufacturing organic apparatus and method for manufacturing framed vapor deposition hood.
TW202639897APending Publication Date: 2026-10-01DAI NIPPON PRINTING CO LTD
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Patent Information
- Application Number
- TW115121041
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-01-31
- Filing Date
- 2023-01-31
- Publication Date
- 2026-10-01
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Abstract
The vapor deposition mask of the present invention comprises: a mask substrate containing silicon; a mask layer having a first surface and a second surface, the second surface being located on the side opposite to the first surface and facing the mask substrate; and a through hole penetrating the mask layer. The mask substrate has a substrate opening. Viewed from above, the through hole is located within the substrate opening. The mask layer has a mask body layer constituting the first surface and a mask interlayer located between the mask body layer and the mask substrate. The mask body layer contains a metallic material.
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